The project Development of Lithography Technology for Nanoscale Structuring of Materials Using Laser Beam Interference (DELILA) focuses on researching and developing a new production technology for fabrication of 2D and 3D nano structures and devices. In particular, DELILA will enable low cost and large volume production of surface structures and patterns with nanometric resolution.

Industrial end-users are currently discouraged from expanding their nanotechnology-related business activities by either unacceptably high costs or the impossibility to control production processes on a nanometric scale. DELILA will play a key role in realising the full potential of interference nanolithography by combining optical technology, ICT and micro/nano-technology, as current nanofabrication tools are limited to archaic, slow processing rates, or do not achieve a competitive cost-effective strategy.

DELILA is a specific targeted research project (STREP) , supported by EC funding from the Sixth Framework Programme (FP6). The consortium consists of five partners: the Manufacturing Engineering Centre (MEC) of Cardiff University in the UK (coordinator), the Optoelectronics Research Centre (ORC) of Tampere University of Technology in Finland, SILIOS Technologies SA (SILIOS) in France, the Institute of Applied Physics (IAP) of Russian Academy of Sciences in Russia, and the Department of Microelectronics of Centro de Estudios e Investigaciones Técnicas de Gipuzkoa (CEIT) in Spain.